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Improved corrosion and wear resistance on complex tools and components

Chromium Nitride (CrN) coatings deposited by non-hazardous Physical Vapor Deposition (PVD) could serve as a very good alternative for the hard chrome electroplating process.


New “ionized PVD technology” (iPVD), High Power Impulse Magnetron Sputtering (HIPIMS) and Modulated Pulse Power (MPP) enables to overcome the mentioned drawbacks of the PVD technique by pulsed power sputtering. Despite the excellent properties obtained, the pulsed nature of the technique limits the deposition rate down to 30% of traditional PVD deposition rates and is the bottleneck for a fast and successful take-up by industry.


This project aims at increasing the deposition rate to 80% of the traditional PVD process with a focus on a breakthrough industrial uptake of the technology.


For more info on the project, click following link.



With partners:


With financial support of: